Racks

  • Rack with option INIRA®

  • Rack with standard mounting system

  • INIRA® pinning offers a chipless pinning of racks, which reduces assembly times considerably
  • Premium Linear System with premo® High Line


The suitable rack for every requirement

Needless to say, finding the appropriate rack is an essential component in realizing your machine concepts. You are guaranteed to find the perfect rack in our portfolio. You can select the ideal rack for your application, depending on your demands in terms of smooth running, positioning accuracy, feed force and ease of installation.

INIRA® – The revolution in rack assembly

Customized solutions

We will develop a solution for you that is tailored to your drive needs. You will benefit from our years of experience, our highly skilled staff and our services. Please contact us.

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WITTENSTEIN alpha GmbH - Walter-Wittenstein-Str. 1

WITTENSTEIN alpha GmbH

Walter-Wittenstein-Str. 1

97999 Igersheim (Germany)

  • Technical data
Segment ValueAdvancedPremium
Modulem [mm]1,5; 2; 3; 42; 3; 4; 5; 6; 82; 3; 4; 5; 6; 8
Length a)L [mm]500 - 2000167 – 1000 a)167 – 1000 a)
Bore spacingl1 [mm]12562,5 b); 12562,5 b); 125
Smooth running Level 2Level 2; 3Level 3; 4
Positoning accurary Level 2Level 2; 3Level 3; 4
Feed force Level 1Level 2; 3; 4Level 3; 4
Helical toothed 
Straight toothed - c)- c)- c)
INIRA® - c)
Customer specific length and drillings ✓ c)✓ c)✓ c)

Technical data for the linear drive result from the interaction of gearbox, pinion and rack. 
See the preferred linear systems in the catalog or individual configuration options in cymex®.

a) Available intermediate lengths depending on module

b) 62.5 mm bore spacing in conjunction with Level 4 feed force

c) On request

Produkthighlights

Reliability

Fatigue strength sizing of the gearing avoids costly machine downtime

Efficiency

INIRA® enables a significant reduction in assembly time and thus reduces lead times. 

Positioning accuracy

Based on the respective requirement, the appropriate variant can be selected for the application.